SiO2+Ti+Pt(111) thin film on Si substrate ,4"x0.525mm,1sp P-type B-doped,( SiO2=300nm,Ti=10nm ,Pt(111)=150nm) Pyrolytic Graphite Substrate & Foam 60/40 and Surface Roughness Ra:

60/40 and Surface Roughness Ra: < 0

(click the underlined words to order the thermocouple)

Nominal FTO Film thickness: 200 nm

Resistivity:                    1~10  ohm-cm  (If you would like to measure the resistivity accurately

Measurement cycles

SiO2+Ti+Pt(111) thin film on Si substrate ,4"x0.525mm,1sp P-type B-doped,( SiO2=300nm,Ti=10nm ,Pt(111)=150nm) Pyrolytic Graphite Substrate & Foam 60/40 and Surface Roughness Ra:Silicon Wafer Specifications: Film: SiO2+Ti+Pt(111) thin film on Si (100) (P type) substrate ,4"x0. 525mm,1sp SiO2=300nm Ti=10nm Pt(111)=150nm Resistivity: 1 20 ohm. cm (If you would like to measure the resistivity accurately, please order our Portable 4 Probe Resistivity Testing Instrument.) Substrate Size: 4" diameter + 0. 5 mm x 0. 525 mm Polish: one side polished Surface roughness: < 20 A RMS Maximum Thermal Budget of Pt Ti film coated SiO2 Si