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Raman ECF H-Cell 3.5 cm2, 4.5+2 mL – Raman Electrochemical Flow H-Cell, active area: 3.5 cm2, volume: 4.5+2 mL Fuse Material hardness must be lower

$2819.00

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Description

Material hardness must be lower than Mohs 8

Dielectric Constant:                            es11 / e0:  39 ~43                       es33 / e0:  42 ~43

Substrate Sapphire

It is characterized by exceptional corrosion resistance and an extremely high surface area

Wafer Size:                           2" dia x  500 microns

Raman ECF H-Cell 3.5 cm2, 4.5+2 mL – Raman Electrochemical Flow H-Cell, active area: 3.5 cm2, volume: 4.5+2 mL Fuse Material hardness must be lowerThis cell combines two classical analytical techniques such as electrochemistry and Raman spectroscopy, to obtain in situ chemical information about the reactions taking place during an electrochemical experiment. The Raman Electrochemical Flow H Cell offers several advantages over a single compartment Raman Electrochemical Flow Cell. First of all the ion exchange membrane allows for the physical separation of the anode and cathode compartments. This

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