P02300 - SEMI P23 - Guidelines for Programmed Defect Masks and Benchmark Procedures for Sensitivity Analysis of Mask Defect Inspection Systems Lang-Korean The purpose of this Test

The purpose of this Test Method is to specify methods for the contactless measurement of the resistivity of semi-insulating samples and wafers

1  This Standard specifies the classes that suppliers are to use to describe essential data

very small densities of these impurities (»1010 atoms/cm3) reduce the carrier recombination lifetime and adversely affect device and circuit performance

SEMI MF728-1106 (Reapproved 0622)

SEMI C30 — Specification and Guide for Hydrogen Peroxide

P02300 - SEMI P23 - Guidelines for Programmed Defect Masks and Benchmark Procedures for Sensitivity Analysis of Mask Defect Inspection Systems Lang-Korean The purpose of this TestThis standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 5, 2007. It was available at www. semi. org in October 2007. Originally published in 1993; previously published in February 2000. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive