M04000 - SEMI M40 - シリコンウェーハ表面のラフネス測定のガイド Revision:SEMI M40-1109 - Superseded This Guide is intended to

This Guide is intended to prevent confusion and misunderstanding between manufacturers and users

SEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers

silicon nitride based layers by atomic layer deposition

are insufficiently established to allow an unambiguous specification

The quality parameters assessed

M04000 - SEMI M40 - シリコンウェーハ表面のラフネス測定のガイド Revision:SEMI M40-1109 - Superseded This Guide is intended toglobal Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM20002 SEMI M1 3 Referenced SEMI Standards SEMI E89 Guide for Measurement System Analysis (MSA) SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M50 Test Method for Determining Capture Rate and False Count Rate